Group Theses

Devin M.Lewis, "Stability of LiF Mirror Coatings on Space Telescopes at L2 Orbit" (Masters Thesis, 2024). Full Text PDF
CameronKubal, "Process Analysis and Guide on The Development and Manufacture of Simulation Ammunition for Purpose of Law Enforcement Training" (Capstone, 2024). Full Text PDF
Alexandra Kathryn KananiStapley, ""Vampire Plastics": An Investigation of Poly(olefin sulfone) Depolymerization and Its Dust Mitigation Abilities" (Masters Thesis, 2024). Full Text PDF
TannerRydalch, "Stability and oxidation of Al mirrors coated with Xe-passivated LiF thin films" (Senior Thesis, 2024). Full Text PDF
MichaelGreenburg, "Computationally Modeling Rough Circular Conducting Mirrors" (Senior Thesis, 2024). Full Text PDF
MaraDille, "A Synthesis: Comparing and contrasting my experience in the two areas of scientific/ technical writing and reflections on classroom learning" (Capstone, 2023). Full Text PDF
KendallMitchell, "Slowing of Oxidation for Aluminum Thin-Films through use of High-Volume Oxygen Absorbers" (Senior Thesis, 2023). Full Text PDF
IsaiahGalland, "At-wavelength Reflectance Measurements for Aluminum Mirrors in the Far Ultraviolet" (Senior Thesis, 2023). Full Text PDF
DonovanSmith, "Retardation of the oxidation of aluminum thin films in low-oxygen and cryogenic environments" (Capstone, 2023). Full Text PDF
CollinBradford, "Automating Nuclear Reactor Modeling for Simulation Using OpenMC and Python" (Capstone, 2023). Full Text PDF
AlexGallion, "Photodegradation of Self-Immolating Polymers as a Potential Solution to Optical Scattering" (Senior Thesis, 2023). Full Text PDF
EdKrzymowski, "Electron Cryotomography of Bacterial Secretion Systems" (Capstone, 2022). Full Text PDF
WinstonMcElwain, "National Vision Optics Lab Order of operations manual" (Capstone, 2022). Full Text PDF
MerlinHart, "Retarding the Growth of Oxide on Aluminum Thin-Films" (Senior Thesis, 2022). Full Text PDF
BrookeCroxall, "The Indices of Refraction of SiO₂ and AlF₃ in the XUV Determined from Simultaneous Reflection and Transmission Measurements on XUV Diodes" (Capstone, 2022). Full Text PDF
DevinLewis, "Degradation of Lithium Fluoride Mirror Coatings in Humid Environments" (Senior Thesis, 2021). Full Text PDF
EthanEdwards, "Modeling Surface Imperfections on Diffraction Gratings for the Extreme Ultraviolet" (Senior Thesis, 2021). Full Text PDF
GabeRichardson, "Computational Development of a Miniature Quantum Dot Spectrometer for Use in Space" (Senior Thesis, 2021). Full Text PDF
LoganPage, "“Stainless Uranium” - Oxidation Prevention in Uranium-Niobium Alloys" (Senior Thesis, 2021). Full Text PDF
JennyKang, "Red/green Colorblindness Simulation: Creating a Colorblind Friendly Environment" (Capstone, 2021). Full Text PDF
KenanFronk, "Storage of Al/AlF3 Thin-Film Mirrors in 327 K Oven" (Capstone, 2021). Full Text PDF
JamesAdams, "Design and Manufacturing of Control System for Monochromator" (Capstone, 2020). Full Text PDF
JamesErikson, "Photoluminescence Lifetime as an Indicator of Temperature in Materials" (Senior Thesis, 2020). Full Text PDF
NickSteil, "Connecting Physics and Finance" (Capstone, 2019). Full Text PDF
DanielJones, "Photometric and Polarimetric Signatures of Geosynchronous Satellites" (Senior Thesis, 2019). Full Text PDF
AlexandraDavis, "Oxidation of Aluminum Under Various Thicknesses of Aluminum Fluoride" (Senior Thesis, 2018). Full Text PDF
JesseRichmond, "Surface-Atmosphere Interactions with Ultraviolet Light on Mars" (Senior Thesis, 2018). Full Text PDF
MargaretMiles, "Evaporated Aluminum Fluoride as a Barrier Layer to Retard Oxidation of Aluminum Mirrors" (Masters Thesis, 2017). Full Text PDF
SpencerWillett, "Making aluminum shine again, removing polymers used to protect aluminum from oxidization" (Senior Thesis, 2017). Full Text PDF
StephanieThomas, "Preventing Oxidation of Aluminum Mirrors with Cadmium and Zinc Barriers" (Senior Thesis, 2017). Full Text PDF
SpencerThevenin, "Effects of Roughness on Reflection of Monochromatic Light" (Senior Thesis, 2017). Full Text PDF
BenjaminSmith, "Reflectance Measurements of Two Thin Film Materials in the UV" (Senior Thesis, 2015). Full Text PDF
BrandonMcKeon, "Characterization of Silicon Dioxide Thin Film Deposition" (Senior Thesis, 2015). Full Text PDF
CodyPetrie, "Determining thin film roughness with EUV reflection" (Senior Thesis, 2014). Full Text PDF
CollinBrown, "Infiltration of CNT forests by Atomic Layer Deposition for MEMS Applications" (Senior Thesis, 2014). Full Text PDF
JoshuaMarx, "Determining Surface Roughness Using Extreme Ultraviolet LIght" (Senior Thesis, 2014). Full Text PDF
Jason Kyle Anderson, "Developing Atomic Layer Deposition Techniques of Tungsten on Carbon Nanotube Microstructures" (Senior Thesis, 2014). Full Text PDF
JordanBell, "Thickness Uniformity Of Uranium Oxide Films Sputtered While Undergoing Planetary Motion" (Senior Thesis, 2013). Full Text PDF
JamesSchwab, "Investigations of the Causes of Expansion for Yttrium Oxide Films" (Capstone, 2013). Full Text PDF
StuartHarper, "Statistical Analysis of Noise From Solid Rocket Motors" (Senior Thesis, 2012). Full Text PDF
GregoryHart, "Correcting for Reflection Attenuation in the Extreme Ultraviolet Due to Surfce Roughness" (Senior Thesis, 2012). Full Text PDF
RichardHansen, "Mechanical and Electrical Properties of Carbon-Nanotube-Templated Metallic Microstructures" (Honors Thesis, 2012). Full Text PDF
AlisonWells, "Determining The Cause Of Metal Oxide Film Growth Due To Exposure To Vacuum Ultraviolet Light" (Senior Thesis, 2011). Full Text PDF
DevonMortensen, "Determining The Cause Of Yttria Film Growth Due To Exposure To Vacuum-Ultraviolet Light" (Senior Thesis, 2010). Full Text PDF
JonBrame, "Selectively Grown Silicon Nanowires For Transistor Devices" (Senior Thesis, 2009). Full Text PDF
JosephMuhlestein, "Optical Constants for Y₂O₃ in the Extreme Ultraviolet" (Senior Thesis, 2009). Full Text PDF
W. ToddDoughty, "Roughness Correction Model For Reflection From Perfectly Conducting Scatterers" (Senior Thesis, 2008). Full Text PDF
ElisabethStrein, "Studying And Eliminating Adventitious Carbon Contamination On Silicon Wafers" (Senior Thesis, 2008). Full Text PDF
BryanHicks, "Diode Properties of Nanotube Networks" (Capstone, 2008). Full Text PDF
Guillermo AntonioAcosta, "Scandium Oxide Thin Films and Their Optical Properties in the Extreme Ultraviolet" (PhD Dissertation, 2007). Full Text PDF
RobertGillis, "Determining The Extreme Ultraviolet Constants Of Thoria By Spectral Ellipsometry." (Capstone, 2007). Full Text PDF
AmyGrigg, "Oxidation Effects On The Optical Constants Of Heavy Metals In The Extreme Ultraviolet" (Honors Thesis, 2007). Full Text PDF
MarianAdamson, "Detection Of Trace Metal Contaminants In Model Biological Tissue With Laser-Induced Breakdown Spectroscopy" (Senior Thesis, 2007). Full Text PDF
JacqualineJackson, "Determining The Refractive Index Of Scandium Oxide In The Euv Using Kramers-Kronig On Thin-Film Transmission Data" (Honors Thesis, 2007). Full Text PDF
EliseMartin, "Surface-Roughness Corrections To Extreme Ultraviolet Thin-Film Reflectance Measurements" (Senior Thesis, 2007). Full Text PDF
Jedediah Edward JensenJohnson, "Computationally Modeling the Effects of Surface Roughness on Soft X-Ray Multilayer Reflectors" (Masters Thesis, 2006). Full Text PDF
JefferyHallstrom, "Mirror Designer User’s Guide: Using a Genetic Algorithm to Design Multilayer Mirrors" (Capstone, 2005). Full Text PDF
NicoleBrimhall (Farnsworth), "Thorium-Based Mirrors in the Extreme Ultra Violet Optical Application of Uranium Thin Film Compounds for the Extreme Ultraviolet and Soft X-Ray Region" (Honors Thesis, 2005). Full Text PDF
RyanCamacho, "Microstructural Analysis of Copper Thin Films for Characterization of Stress-Induced Voiding Mechanisms" (Senior Thesis, 2003). Full Text PDF
David TooneOliphant, "Characterization of Uranium, Uranium Oxide and Silicon Multilayer Thin Films" (Masters Thesis, 2000). Full Text PDF
ShannonLunt, "The Use of Genetic Algorithms in Multilayer Mirror Optimization" (Honors Thesis, 1999). Full Text PDF

Theses, Captstones, and Dissertations

Effects of Roughness on Reflection of Monochromatic Light (by Spencer Thevenin)

If the scale of surface roughness is on the order of the wavelength of incident light, traditional optics methods like ray tracing and physical optics fail to adequately model reflectance. In this project, boundary integral techniques were chosen because they provide direct solutions only limited by computer memory. Discretizing Maxwell's equations across a surface yields an $Ax=b$ matrix equation relating the surface current to electric field over a net of points. Reflectance calculations for transverse-magnetic (TM) waves on a perfect conductor in two dimensions are analyzed in depth to model the effects of scattering from surface roughness. Root mean square (rms) furface roughness more than a hundredth the wavelength of the incident beam is noticeable and anything larger than a tenth the wavelength dominates the reflectance. These calculations allow for comparison with previous approaches --such as the scalar correction factors of Debye-Waller -- at various spatial frequencies. The Debye-Waller models the smaller roughness but loses precision as roughness increases. The effects of spatial frequencies are also analyzed are compared to the current work of Stearn in showing additional surface parameters affecting roughness. The results of altering spatial frequency supports the work of stern suggesting additional parameters like spatial frequency are factors that affect overall reflectance. Optimizing the calculation through generating and solving the matrix equation are analyzed. Nonsingular, off-diagonal elements of the relation matrix are relatively slow to calculate in the generation process. A method using the multipole expansion is theorized to combat this inefficiency.

Reflectance Measurements of Two Thin Film Materials in the UV (by Benjamin Smith)

Abstract Text: The optical constants for yttrium oxide are presented for the 8.5-31 nm range. \mbox{Y}_{2}\mbox{O}_{3} thin films have shown promise as a non-volatile reflector for EUV light at \lambda 30.4 nm. Samples were prepared using e-beam vapor deposition and annealed at 800 K and 825 K. Optical constants were measured using reflectance methods at the Advanced Light Source. Measured values are compared to similar data taken in 2009 as well as calculations from the CXRO atomic scattering factors. I also present an experimental system to produce and measure the reflectance of aluminum films in the VUV range of 70-95 nm with applications in space-based astrophysical research. A hollow cathode He+ plasma discharge source was constructed and attached to a recommissioned monochromator and a variable-angle reflectometer. I provide some preliminary spectral and spatial characterizations of the UV light.

Characterization of Silicon Dioxide Thin Film Deposition (by Brandon McKeon)

Silicon dioxide (SiO2) is useful in microelectronics, micro-fabrication and optics. It has traditionally been deposited through low-pressure chemical vapor deposition (LPCVD) at high temperatures (about 900 to 1000 C). Various reactants have been used in this process, such as dichlorosilane and oxygen, or silane and nitrous oxide in different combinations. We explore the reaction of dichlorosilane and nitrous oxide in SiO2 LPCVD by varying the temperature from 850 to 950 C and the pressure from 0.30 to 1.05 Torr. Films with mirror-like surfaces are deposited in an ambient temperature of 900 C, with a gas ratio of 3.33 parts nitrous oxide for every one part dichlorosilane, and at a pressure between 0.35 and 0.69 Torr, while pressures outside of this range result in foggy surfaces or no deposition. These results are in good agreement with previous work and indicate that careful control of pressure is necessary for depositing uniform films for use in optical applications.

Determining thin film roughness with EUV reflection (by Cody Petrie)

We have developed a method to measure the roughness of thin films using extreme ultraviolet (EUV) light. This method is more sensitive to roughness with characteristic features on the length scale of a wavelength of light (a few nm) than existing methods like atomic force microscopy (AFM). We have used EUV reflection, geometrical optics (GO), and physical optics (PO) calcula- tions to determine the roughness of UOx thin films. The two samples we have used had thicknesses of 44 and 412 nm respectively. We have generated random rough surface models and used PO to calculate the reflection that we should see from these surfaces. These calculations were compared to reflection measurements taken on each sample at the Advanced Light Source to determine the roughness of each sample. We were not able to fit PO calculations to the 44 nm data, but were able to get some insight into the topography of the surface with GO. Four measurements were taken on the 412 nm sample at different incident angles and with different wavelengths of EUV light. We modeled the surface with the rms roughness height and the width of the Gaussian packet of spatial frequencies. We determined the rms height to be 0.78±0.15 nm and the width of the Gaussian packet to be 8.3 × 10−5 ± 2.7 × 10−5 nm−1. For the 412 nm sample the AFM determined the rms roughness heights to be 9.39 nm. This shows that our method has potential to provide more reso- lution than AFM in measuring surface roughness. This also demonstrates that optical techniques provide a potential means for measuring roughness when other methods are inaccurate.

Infiltration of CNT forests by Atomic Layer Deposition for MEMS Applications (by Collin Brown)

Abstract Text: The fabrication of microelectromechanical systems (MEMS) is generally limited by the same processes and materials used in the semiconductor industry. We have been investigating the infiltration of patterned carbon nanotube (CNT) forests to find more materials and potentially easier methods to make MEMS. Our goal is to fill in the void between the nanotubes in the CNT forest with deposited metal, creating a solid metal-carbon hybrid in the same shape as the CNT forest. Previous students here at BYU investigated the infiltration of molybdenum and tungsten metal using molybdenum carbonyl and tungsten carbonyl, respectively, as precursors in chemical vapor deposition (CVD). The current topic of research is infiltration by atomic layer deposition (ALD) using tungsten hexafluoride and hydrogen (including atomic hydrogen via microwave plasma) as precursors. In the course of this research, we have seen the tungsten deposited as a crust over the top of the CNT forest, penetrating only microns into the forest.

Determining Surface Roughness Using Extreme Ultraviolet LIght (by Joshua Marx)

I used extreme ultraviolet light to find the surface roughness of three Uranium Oxide thin films of approximate thicknesses 140 nm, 114 nm, and 40-45 nm. The wafers were first scanned to measure the non-specular reflectance of each sample. I combined the scans with the same angle of incidence, and then normalized the combined data to calculate the reflectance per unit angle using diffuse reflection. Next, I compared the data to Huygens' and geometrical optics calculations to estimate surface RMS height and the spatial frequency distribution. I have also compared the roughness height and frequency distribution to measurements taken on the SEM. By comparing our non-specular curves to geometrical optics, Huygens' calculations and physical measurements we are able to create a model accurate enough to describe the non-specular scattering from surfaces with roughness having spatial frequencies much less than one over the wavelength. Our research group hopes to be able to use this data make smoother samples in the future and find new and better ways to model thin film surfaces.